Manufacturing Suite

Platform Overview

notion image

1. AI-Driven Process Optimization

Platform Overview
The InfiniTree Process Optimization Platform is an AI-powered solution that automatically identifies optimal operating conditions for semiconductor manufacturing processes — from data collection to real-time control.
Engineers define target KPIs such as yield, throughput, uniformity, and process stability.
The platform analyzes complex multi-variable interactions and continuously recommends optimized process parameters with quantified confidence levels.
Core Capabilities
  • Intelligent Variable Selection Engine
    Automatically identifies the critical process parameters that most significantly impact target outcomes from thousands of candidates using proprietary probabilistic methods.
  • Surrogate-Based Optimization
    Builds lightweight surrogate models of complex process behavior and rapidly searches for optimal operating conditions balancing yield, stability, and efficiency.
  • Uncertainty-Aware Prediction
    Quantifies prediction confidence, enabling reliable decision-making even with limited process data.
  • Optimization Agent
    Model-based optimization continuously explores and refines process conditions within a Digital Twin environment for autonomous optimization.
  • End-to-End Closed-Loop Operation
    A seamless pipeline from IoT sensor data collection through AI prediction to real-time process control and monitoring dashboard.
Application Domains
  • Semiconductor Fabrication Process Optimization
  • Chemical & Petrochemical Process Control
  • Battery Material Manufacturing
  • Carbon Capture & Utilization (CCU) Process
  • High-Reliability Process for Automotive & Industrial Systems
  • Custom Process Optimization for Specialty Manufacturing
Semiconductor process optimization is currently a primary application domain, but the platform is designed to scale across a broad range of industrial process categories.

2. AI-Based Defect Detection

Platform Overview
The InfiniTree Defect Detection Platform is an AI-powered solution that automatically identifies and classifies process defects across semiconductor manufacturing — from inline inspection data to root cause analysis.
Engineers define defect classification criteria, yield targets, and quality thresholds.
The platform automatically detects anomalies, classifies defect types, and traces root causes to specific process variables with actionable insights.
Core Capabilities
  • Intelligent Anomaly Detection Engine
    Automatically detects process deviations and emerging defect patterns in real-time using multivariate statistical analysis and deep learning.
  • Defect Classification & Prioritization
    Classifies defects by type, severity, and impact on yield, enabling engineers to focus on the most critical issues first.
  • Robust Monitoring
    Continuous high-sigma process monitoring ensures early detection of subtle shifts before they escalate into yield-impacting excursions.
  • End-to-End Root Cause Tracing
    A seamless pipeline from defect detection through correlation analysis to process variable root cause identification and corrective action recommendation.
Application Domains
  • Wafer-Level Inline Defect Inspection
  • Post-Etch & Post-CMP Defect Monitoring
  • Pattern Defect Classification (Bridge, Open, Particle, etc.)
  • Yield-Defect Correlation Analysis
  • Equipment Health Monitoring & Predictive Maintenance
  • Custom Defect Detection for Advanced Packaging
Wafer-level inline inspection is currently a primary application domain, but the platform is designed to scale across all stages of semiconductor manufacturing and quality control.

3. AI-Powered OPC (Optical Proximity Correction)

Platform Overview
The InfiniTree OPC Platform is an AI-driven solution that automates optical proximity correction for advanced semiconductor lithography — from layout analysis to mask pattern generation.
Engineers input target design rules, process conditions, and lithography constraints.
The platform automatically generates corrected mask patterns that ensure accurate pattern transfer onto the wafer with minimal distortion.
Core Capabilities
  • AI-Driven Correction Engine
    Automatically determines optimal OPC recipes and correction strategies based on layout patterns and process characteristics.
  • High-Dimensional Pattern Optimization
    Finds optimal correction parameters by modeling the complex relationship between mask geometry, optical effects, and resist behavior.
  • End-to-End Automation
    A seamless flow from design layout input to corrected mask data output with comprehensive verification reports.
Application Domains
  • Advanced Node Full-Chip OPC
  • Inverse Lithography Technology (ILT)
  • EUV Lithography Mask Optimization
  • DTCO (Design-Technology Co-Optimization)
  • Specialty Lithography for Analog & Mixed-Signal IP
  • Custom Mask Correction for Foundry & IDM
Advanced logic node OPC is currently a primary application domain, but the platform is designed to scale across diverse lithography technology nodes and process requirements.